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The Center for Research on Interface Structures and Phenomena (CRISP) is a National Science Foundation (NSF) Materials Research Science and Engineering Center (MRSEC). CRISP is a partnership between Yale University, Southern Connecticut State University (SCSU) and Brookhaven National Laboratory. A main focus of CRISP research is complex oxide interfaces that are prepared using epitaxial techniques, including molecular beam epitaxy (MBE). Complex oxides exhibit a wealth of electronic, magnetic and chemical behaviors, and the surfaces and interfaces of complex oxides can have properties that differ substantially from those of the corresponding bulk materials. CRISP employs this research program in a concerted way to educate students at all levels. CRISP has constructed a robust MBE apparatus specifically designed for safe and productive use by undergraduates. Students can grow their own samples and then characterize them with facilities at both Yale and SCSU, providing a complete research and educational experience. This paper will focus on the implementation of the CRISP Teaching MBE facility and its use in the study of the synthesis and properties of the crystalline oxide-silicon interface. C 2010 Materials Research Society.
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Applications of nanoscience in the non-traditional classroom have successfully exposed students to various methods of research with applications to micro- and nano-electronics. Activities obtained from the NanoSense website associated with current global energy and water concerns are solid examples 1. In this regard, all 36 students in the 2008-2009 Science Research Program (SRP) prepared and delivered individual and group lesson plans in addition to their authentic, year-long research projects. Two out of 36 students selected nanoscience based projects in preparation for science fair competition in 2009. Additionally, preliminary research was conducted while participating in the Center for Research on Interface Structures and Phenomena (CRISP) Research Experience for Teachers (RET) Program in summer 2008 which supported the idea of developing a photolithography kit. This kit is intended to introduce high school students to the fundamentals of photolithography. In this paper, the design, implementation and feasibility of this kit in the high school classroom is described as well as details involving individual and group nanoscience based projects. Supporting educational models include self-regulated learning (SRL) concepts: situated cognition; social constructivism; Renzulli's (1977) enrichment triad and Types I - III inquiry enrichment activities 2,3. © 2009 Materials Research Society.
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