Patterned deposition of nanoparticles using dip pen nanolithography for synthesis of carbon nanotubes

Ordered carbon nanotube (CNT) growth by deposition of nanoparticle catalysts using dip pen nanolithography (DPN) is presented. DPN is a direct write, tip based lithography technique capable of multi-component deposition of a wide range of materials with nanometer precision. A Nanolnk NLP 2000 is used to pattern different catalytic nanoparticle solutions on various substrates. To generate a uniform pattern of nanoparticle clusters, various conditions need to be considered. These parameters include: the humidity in the vessel, temperature, and tip-surface dwell time. By patterning different nanoparticle solutions next to each other, identical growth conditions can be compared for different catalysts in a streamlined analysis process. Fe, Ni, and Co nanoparticle solutions patterned on silicon, mica, and graphite substrates serve as nucleation sites for CNT growth. The CNTs were synthesized by a chemical vapor deposition (CVD) reaction. Each nanoparticle patterned substrate is placed in a tube furnace held at 725°C during CNT growth. The carbon source used in the growth chamber is toluene. The toluene is injected at a rate of 5 mL/hr. Growth is observed for Fe and Ni nanoparticle patterns, but is lacking for the Co patterns. The results of these reactions provide important information regarding efficient and highly reproducible mechanisms for CNT growth. © 2015 Materials Research Society.

0 citations (Crossref) [2023-10-31] Citation Key Alias: lens.org/070-622-015-549-684 tex.type: [object Object]